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The FLX Systems Measure Curvature and then Calculate Stress:
- The FLX tools are designed to measure the shape change caused by the film deposition and calculate the corresponding film stress.
- The stress is calculated from the curvature change caused by the addition of the film.
- The key point is that the FLX tool measures the curvature of the wafer caused by the film deposition.
- The film stress is calculated using elasticity equations.
- Since stress is force normalized by area, it is a field variable, and therefore it cannot be measured directly only the effect of stress is measurable.
- From the measurement results, the field strength is calculated from an equation.
- The application of stress to any object will always be accompanied by some deformation, called strain.
- The deformation can be measured, and the stress that caused the deformation can be calculated if a theory exists to relate stress to strain for the system being measured.
- The tiny chemical or physical forces that develop in the thin film during the deposition will cause a stress in the film resulting in a slight bending of the wafer.
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